发明名称 GAS SUPPLY DEVICE, FILM FORMING APPARATUS, GAS SUPPLY METHOD, AND STORAGE MEDIUM
摘要 A gas supply device for intermittently supplying raw material gas into a film forming process unit that includes a raw material container for accommodating a raw material, a carrier gas supply unit for supplying carrier gas to evaporate the raw material, a raw material gas supply path for supplying the raw material gas and the carrier gas into the film forming process unit, a flow rate detector, a flow rate regulating valve, a raw material supply and block unit for supplying and blocking the raw material gas into the film forming process unit, and a control unit for outputting a control signal for intermittently supplying the raw material gas into the film forming process unit.
申请公布号 US2015140694(A1) 申请公布日期 2015.05.21
申请号 US201414548654 申请日期 2014.11.20
申请人 TOKYO ELECTRON LIMITED 发明人 INOUE Mitsuya;TAKADO Makoto
分类号 C23C16/52;H01L21/66;H01L21/02;C23C16/448;C23C16/455 主分类号 C23C16/52
代理机构 代理人
主权项 1. A gas supply device for intermittently supplying raw material gas into a film forming process unit for subjecting a substrate to a film forming process, comprising: a raw material container configured to accommodate a solid or liquid raw material; a carrier gas supply unit configured to supply carrier gas to evaporate or sublime the raw material in the raw material container; a raw material gas supply path configured to supply the raw material gas including the evaporated or sublimed raw material and the carrier gas into the film forming process unit; a flow rate detector for the raw material gas and a flow rate regulating valve for the raw material gas, which are installed in the raw material gas supply path; a raw material supply and block unit configured to supply and block the raw material gas into the film forming process unit; and a control unit configured to output a control signal to cause a first process and a second process to be performed when the substrate is loaded into the film forming process unit, the first process including determining a flow rate of the raw material in the raw material gas based on a flow rate of the carrier gas supplied from the carrier gas supply unit and a flow rate of the raw material gas detected by the flow rate detector and obtaining a degree of opening the flow rate regulating valve with which the flow rate of the raw material is set to be a pre-set value, and the second process including supplying and blocking the raw material gas by using the raw material supply and block unit in order to intermittently supply the raw material gas into the film forming process unit with the degree of opening the flow rate regulating valve being fixed at the obtained degree of opening.
地址 TOKYO JP