| 摘要 |
An embodiment of the present invention relates to a flow control monitoring device and a method thereof. The technical objective to be solved is to monitor the state and performance of actual MFC by comparing and analyzing the difference between a flow rate to be supplied and a flow rate to be actually supplied through a control signal of MFC and an actual MFC operation signal. To achieve the objective, an embodiment of the present invention discloses a flow control monitoring device which monitors the operation state of an MFC chamber capable of controlling a flow rate supplied to a semiconductor facility. The flow control monitoring device comprises; an MFC controller which receives a control signal to control a flow supply to the MFC chamber from the outside; and a main controller which is connected between the MFC controller and the MFC chamber. The main controller monitors the operation state of the MFC chamber to control the flow rate of the MFC chamber by comparing and analyzing; a standard arrival time of a predetermined fluid to the MFC chamber; a standard slope from a supply curve of the fluid arrived to a predetermined control value; a total standard flow value supplied to the MFC chamber; an actual arrival time of the flow to the MFC chamber by the control signal; a slope at the supply curve of the flow arrived to the control value; and an actual total flow value supplied to the MFC chamber. |
