发明名称 |
SEMICONDUCTOR DEVICES WITH INTEGRATED SCHOTKY DIODES AND METHODS OF FABRICATION |
摘要 |
An embodiment of a semiconductor device includes a semiconductor substrate that includes an upper surface and a channel, a gate electrode disposed over the substrate electrically coupled to the channel, and a Schottky metal layer disposed over the substrate adjacent the gate electrode. The Schottky metal layer includes a Schottky contact electrically coupled to the channel which provides a Schottky junction and at least one alignment mark disposed over the semiconductor substrate. A method for fabricating the semiconductor device includes creating an isolation region that defines an active region along an upper surface of a semiconductor substrate, forming a gate electrode over the semiconductor substrate in the active region, and forming a Schottky metal layer over the semiconductor substrate. Forming the Schottky metal layer includes forming at least one Schottky contact electrically coupled to the channel and providing a Schottky junction, and forming an alignment mark in the isolation region. |
申请公布号 |
US2015137135(A1) |
申请公布日期 |
2015.05.21 |
申请号 |
US201314084335 |
申请日期 |
2013.11.19 |
申请人 |
GREEN BRUCE M.;HILL DARRELL G.;MOORE KAREN E. |
发明人 |
GREEN BRUCE M.;HILL DARRELL G.;MOORE KAREN E. |
分类号 |
H01L27/06;H01L29/66;H01L29/06;H01L21/311;H01L23/544;H01L29/47;H01L29/20;H01L21/02;H01L29/872;H01L21/8234 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
a semiconductor substrate that includes an upper surface and a channel; a gate electrode disposed over the semiconductor substrate electrically coupled to the channel; and a Schottky metal layer disposed over the semiconductor substrate adjacent the gate electrode, wherein the Schottky metal layer includes a Schottky contact electrically coupled to the channel forming a Schottky junction and at least one alignment mark disposed over the semiconductor substrate. |
地址 |
GILBERT AZ US |