发明名称 FORMING PATTERNS USING CROSSLINKABLE REACTIVE POLYMERS
摘要 Various patterning methods utilize certain crosslinkable reactive polymers comprise -A- and -B- recurring units, arranged randomly along a backbone. The -A- recurring units comprise pendant aromatic sulfonic acid oxime ester groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a λmax of at least 150 nm and up to and including 450 nm. The -A- recurring units are present in the reactive polymer in an amount of up to and including 98 mol % based on total reactive polymer recurring units. The -B- recurring units comprise pendant groups that provide crosslinking upon generation of the aromatic sulfonic acid groups in the -A- recurring units. The -B- recurring units are present in an amount of at least 2 mol %, based on total reactive polymer recurring units.
申请公布号 US2015140481(A1) 申请公布日期 2015.05.21
申请号 US201314084711 申请日期 2013.11.20
申请人 Wexler Allan;Bennett Grace Ann;Lindner Kimberly S. 发明人 Wexler Allan;Bennett Grace Ann;Lindner Kimberly S.
分类号 G03F7/26;G03F7/004 主分类号 G03F7/26
代理机构 代理人
主权项 1. A method comprising: providing a polymeric layer comprising a copolymer that comprises a backbone of at least -A- and -B- recurring units, all recurring units being arranged randomly along the backbone, wherein the -A- recurring units comprise pendant groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a λmax of at least 150 nm and up to and including 450 nm, the -A- recurring units being present in the copolymer in an amount of up to and including 98 mol % based on total copolymer recurring units, andthe -B- recurring units comprise pendant groups that can provide crosslinking upon generation of the aromatic sulfonic acid groups in the -A- recurring units, the -B- recurring units being present in the copolymer in an amount of at least 2 mol %, based on total copolymer recurring units, and pattemwise exposing the polymeric layer to radiation having a λmax of at least 150 nm and up to and including 450 nm to provide pendant sulfonic acid groups in the copolymer and to provide crosslinking in the copolymer in the exposed regions of the polymeric layer.
地址 Pittsford NY US