GROUP 5 TRANSITION METAL-CONTAINING COMPOUNDS FOR VAPOR DEPOSITION OF GROUP 5 TRANSITION METAL-CONTAINING FILMS
摘要
Disclosed are Group 5 transition metal-containing thin film forming precursors. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 5 transition metal-containing thin films on one or more substrates via vapor deposition processes.
申请公布号
WO2015072589(A1)
申请公布日期
2015.05.21
申请号
WO2013KR10274
申请日期
2013.11.13
申请人
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;LANSALOT-MATRAS, CLEMENT;NOH, WONTAE;LEE, JOOHO