发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide an immersion type projection optical system that is a catadioptric type and an off-axis visual field type, and can reduce a range where a liquid (immersion liquid) exists in an image space.SOLUTION: A projection optical system that projects a reduced image of a first surface onto a second surface through a liquid and includes a refractive optical element Lp arranged on the most second surface side; an emission surface Lpb of the refractive optical element has a shape substantially symmetric with respect to two axial directions (X direction and Y direction) orthogonally crossing on the second surface; the central axial line Lpba on the emission surface substantially coincides with the central axial line 40a of a circle 40 corresponding to the circumference of an incidence surface Lpa of the refractive optical element; the central axial line of the emission surface is eccentric from an optical axis AX along one of the two axial directions (Y direction).
申请公布号 JP2015096959(A) 申请公布日期 2015.05.21
申请号 JP20140252508 申请日期 2014.12.12
申请人 NIKON CORP 发明人 OMURA YASUHIRO;OKADA HISAYA;NAGASAKA HIROYUKI
分类号 G02B17/08;G03F7/20;H01L21/027 主分类号 G02B17/08
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