发明名称 |
PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND EXPOSURE METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide an immersion type projection optical system that is a catadioptric type and an off-axis visual field type, and can reduce a range where a liquid (immersion liquid) exists in an image space.SOLUTION: A projection optical system that projects a reduced image of a first surface onto a second surface through a liquid and includes a refractive optical element Lp arranged on the most second surface side; an emission surface Lpb of the refractive optical element has a shape substantially symmetric with respect to two axial directions (X direction and Y direction) orthogonally crossing on the second surface; the central axial line Lpba on the emission surface substantially coincides with the central axial line 40a of a circle 40 corresponding to the circumference of an incidence surface Lpa of the refractive optical element; the central axial line of the emission surface is eccentric from an optical axis AX along one of the two axial directions (Y direction). |
申请公布号 |
JP2015096959(A) |
申请公布日期 |
2015.05.21 |
申请号 |
JP20140252508 |
申请日期 |
2014.12.12 |
申请人 |
NIKON CORP |
发明人 |
OMURA YASUHIRO;OKADA HISAYA;NAGASAKA HIROYUKI |
分类号 |
G02B17/08;G03F7/20;H01L21/027 |
主分类号 |
G02B17/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|