| 发明名称 |
METHOD OF MANUFACTURING DEVICE SUBSTRATE AND DISPLAY DEVICE MANUFACTURED USING THE SAME |
| 摘要 |
The method of manufacturing a device substrate includes forming a surface modifying layer on a process substrate. The surface modifying layer has a different hydrophobicity from that of the process substrate. The process substrate is disposed on a carrier substrate. The surface modifying layer is disposed between the process substrate and the carrier substrate. A device is formed on the process substrate. The process substrate is separated from the carrier substrate. |
| 申请公布号 |
US2015138494(A1) |
申请公布日期 |
2015.05.21 |
| 申请号 |
US201414300397 |
申请日期 |
2014.06.10 |
| 申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
KIM TaeHwan;Kim Myeonghee;Kim Youngbae;Kim Jong Seong;Park Myunghwan;Lee Jonghwan |
| 分类号 |
G02F1/1333;H01L21/768;G02F1/1339;H01L27/12 |
主分类号 |
G02F1/1333 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of manufacturing a device substrate, the method comprising:
forming a surface modifying layer on a process substrate, wherein the surface modifying layer has a hydrophobicity different from a hydrophobicity of the process substrate; disposing the process substrate on a carrier substrate, wherein the surface modifying layer is disposed between the process substrate and the carrier substrate; forming a device on the process substrate; and separating the process substrate from the carrier substrate. |
| 地址 |
Yongin-City KR |
