发明名称 Sn ALLOY PLATING APPARATUS AND Sn ALLOY PLATING METHOD
摘要 An Sn alloy plating apparatus is disclosed which can relatively easily perform control of an Sn alloy plating solution, including control of the Sn ion concentration and the acid concentration of the plating solution. The Sn alloy plating apparatus includes: a plating bath configured to hold therein an Sn alloy plating solution in which an insoluble anode a the substrate are to be disposed opposite each other; a plating-solution circulation line configured to circulate the Sn alloy plating solution in the plating bath; an Sn supply reservoir configured to draw a part of the Sn alloy plating solution from the plating-solution circulation line, perform electrolysis in a presence of the Sn alloy plating solution to replenish the Sn alloy plating solution with Sn ions and an acid that stabilizes Sn ions, and return the Sn alloy plating solution that has been replenished with the Sn ions to the plating bath; and a dialysis unit configured to draw a part of the Sn alloy plating solution from the plating-solution circulation line, remove the acid from the Sn alloy plating solution, and then return the Sn alloy plating solution to the plating bath.
申请公布号 US2015136609(A1) 申请公布日期 2015.05.21
申请号 US201414526421 申请日期 2014.10.28
申请人 EBARA CORPORATION 发明人 SHIMOYAMA Masashi;TAMURA Masamichi;ARAKI Yuji
分类号 C25D21/16;C25D3/60 主分类号 C25D21/16
代理机构 代理人
主权项 1. An Sn alloy plating apparatus for depositing an alloy of Sn and a metal which is nobler than Sn on a surface of a substrate, comprising: a plating bath configured to hold therein an Sn alloy plating solution in which an insoluble anode and the substrate are to be disposed opposite each other; a plating-solution circulation line configured to circulate the Sn alloy plating solution in the plating bath; an Sn supply reservoir configured to draw a part of the Sn alloy plating solution from the plating-solution circulation line, perform electrolysis in a presence of the Sn alloy plating solution to replenish the Sn alloy plating solution with Sn ions and an acid that stabilizes Sn ions, and return the Sn alloy plating solution that has been replenished with the Sn ions to the plating bath; and a dialysis unit configured to draw a part of the Sn alloy plating solution from the plating-solution circulation line, remove the acid from the Sn alloy plating solution, and then return the Sn alloy plating solution to the plating bath.
地址 Tokyo JP