| 摘要 |
PROBLEM TO BE SOLVED: To remedy significant shortcomings of current resists that may appear in high performance applications, such as highly resolved sub-half micron and sub-quarter micron features, and a persistent shortcoming of current resists, that is, poor resolution of "isolated" resist lines or other features, particularly when a positive resist is used.SOLUTION: Provided are new resins that comprise multi-ring aromatic and/or multi-cyclic ester unit which are photoacid-labile. Also provided are chemically amplified positive photoresists that comprise the resins, and multi-ring aromatic and/or multi-cyclic ester monomers. |
