| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film forming apparatus and a thin film forming method which are capable of improving yield coping with mass production while suppressing increase in a size and a cost of an optical system even if a thin film includes an absorption film in a vacuum film deposition process of manufacturing an optical thin film, and capable of monitoring a progress state of reaction when necessary in depositing the film.SOLUTION: A thin film forming apparatus includes: a deposition material supply part arranged in a film deposition chamber; a substrate holder arranged in the film deposition chamber; a light-projecting part which projects monitor light to a substrate to be film-deposited; a first light-receiving part 500 which receives reflected monitor light LR out of monitor light reflected on a front side being a film forming surface of the substrate to be film-deposited, and outputs a first light-reception signal S; a trigger signal output part 35 which outputs a trigger signal Ssynchronized with rotation of the substrate holder; and a signal processing part 70 which performs predetermined signal processing based on the first light-reception signal and the trigger signal to acquire change information of the reflected monitor light by each substrate to be film-deposited. |
