发明名称 |
METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR VERTICAL STRUCTURE LED CHIP |
摘要 |
PROBLEM TO BE SOLVED: To provide a high-quality vertical LED chip which has few cracks in a light-emitting structure section.SOLUTION: A Group III nitride semiconductor vertical structure LED chip comprises such a structure for sandwiching, between a pair of electrodes: a conductive support section serving as a lower electrode; a connection layer provided on the support section; an ohmic electrode layer provided on the connection layer; and a light-emitting structure section which has a second conduction type Group III nitride semiconductor layer, a light-emitting layer provided on the second conduction type Group III nitride semiconductor layer and a first conduction type Group III nitride semiconductor layer that is provided on the light-emitting layer and has a conduction type different from that of the second conduction type. A plane of the light-emitting structure section has a circular shape or a 4n-angled shape (n is a positive integer) with rounded corners at a corner and a plane of the support section has such a shape as to be larger than and different from the plane of the light-emitting structure section. |
申请公布号 |
JP2015097298(A) |
申请公布日期 |
2015.05.21 |
申请号 |
JP20150026774 |
申请日期 |
2015.02.13 |
申请人 |
BBSA LTD;DOWA ELECTRONICS MATERIALS CO LTD |
发明人 |
CHO MEOUNG WHAN;RI AME;JANG PIL GUK;TOBA RYUICHI;TOYODA TATSUNORI;KADOWAKI YOSHITAKA |
分类号 |
H01L33/20;H01L33/32 |
主分类号 |
H01L33/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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