Method of Forming Fine Patterns

摘要

A method of forming a fine pattern comprises depositing a modifying layer on a substrate. A photoresist layer is deposited on the modifying layer, the photoresist layer having a first pattern. The modifying layer is etched according to the first pattern of the photoresist layer. A treatment is performed to the etched modifying layer to form a second pattern, the second pattern having a smaller line width roughness (LWR) and/or line edge roughness (LER) than the first pattern. The second pattern is then etched into the substrate.

主权项

1. A method of forming a fine pattern, comprising:
providing a substrate having a layer thereon; depositing a tri-layer photoresist on the layer, the tri-layer photoresist having a top surface and a bottom surface, the bottom surface being in contact with the layer; patterning the tri-layer photoresist from the top surface to the bottom surface; treating the patterned tri-layer photoresist to smooth surface roughness and edge roughness of the patterned tri-layer photoresist; and etching the layer using the smoothed tri-layer photoresist.