发明名称 MANUFACTURABLE SUB-3 NANOMETER PALLADIUM GAP DEVICES FOR FIXED ELECTRODE TUNNELING RECOGNITION
摘要 A technique is provided for manufacturing a nanogap in a nanodevice. An oxide is disposed on a wafer. A nanowire is disposed on the oxide. A helium ion beam is applied to cut the nanowire into a first nanowire part and a second nanowire part which forms the nanogap in the nanodevice. Applying the helium ion beam to cut the nanogap forms a signature of nanowire material in proximity to at least one opening of the nano gap.
申请公布号 US2015140716(A1) 申请公布日期 2015.05.21
申请号 US201514607694 申请日期 2015.01.28
申请人 International Business Machines Corporation 发明人 Astier Yann;Bai Jingwei;Guillorn Michael A.;Papa Rao Satyavolu S.;Smith Joshua T.
分类号 G01N27/414 主分类号 G01N27/414
代理机构 代理人
主权项 1. A method for manufacturing a nanogap, the method comprising: disposing an oxide on a wafer; disposing a nanowire on the oxide; applying a helium ion beam to taper the nanowire laterally into a first nanowire part and a second nanowire part, the first nanowire part and the second nanowire part forming a first nanogap in a nanodevice; wherein applying the helium ion beam to taper the nanowire laterally forms a bridge connecting the first nanowire part and the second nanowire part; and cutting a second nanogap in the bridge to form a first extension from the first nanowire part and form a second extension from the second nanowire part.
地址 Armonk NY US
您可能感兴趣的专利