发明名称 |
MANUFACTURABLE SUB-3 NANOMETER PALLADIUM GAP DEVICES FOR FIXED ELECTRODE TUNNELING RECOGNITION |
摘要 |
A technique is provided for manufacturing a nanogap in a nanodevice. An oxide is disposed on a wafer. A nanowire is disposed on the oxide. A helium ion beam is applied to cut the nanowire into a first nanowire part and a second nanowire part which forms the nanogap in the nanodevice. Applying the helium ion beam to cut the nanogap forms a signature of nanowire material in proximity to at least one opening of the nano gap. |
申请公布号 |
US2015140716(A1) |
申请公布日期 |
2015.05.21 |
申请号 |
US201514607694 |
申请日期 |
2015.01.28 |
申请人 |
International Business Machines Corporation |
发明人 |
Astier Yann;Bai Jingwei;Guillorn Michael A.;Papa Rao Satyavolu S.;Smith Joshua T. |
分类号 |
G01N27/414 |
主分类号 |
G01N27/414 |
代理机构 |
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代理人 |
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主权项 |
1. A method for manufacturing a nanogap, the method comprising:
disposing an oxide on a wafer; disposing a nanowire on the oxide; applying a helium ion beam to taper the nanowire laterally into a first nanowire part and a second nanowire part, the first nanowire part and the second nanowire part forming a first nanogap in a nanodevice; wherein applying the helium ion beam to taper the nanowire laterally forms a bridge connecting the first nanowire part and the second nanowire part; and cutting a second nanogap in the bridge to form a first extension from the first nanowire part and form a second extension from the second nanowire part. |
地址 |
Armonk NY US |