发明名称 |
MICROWAVE HEATING APPARATUS |
摘要 |
A microwave heating apparatus includes a processing chamber configured to accommodate a substrate; a substrate holding unit configured to hold and rotate the substrate in the processing chamber; a microwave generating source configured to generate a microwave; and a plurality of microwave inlet ports formed at a surface of the processing chamber which faces the substrate in the processing chamber, each of the microwave inlet ports having an opening area that gradually becomes wider toward the substrate. The microwave generated by the microwave generating source is irradiated to the substrate in the processing chamber through the microwave inlet ports to heat the substrate. |
申请公布号 |
US2015136759(A1) |
申请公布日期 |
2015.05.21 |
申请号 |
US201414541010 |
申请日期 |
2014.11.13 |
申请人 |
Tokyo Electron Limited |
发明人 |
IKEDA Taro;TANAKA Sumi |
分类号 |
H05B6/70;H01L21/67;H05B6/64 |
主分类号 |
H05B6/70 |
代理机构 |
|
代理人 |
|
主权项 |
1. A microwave heating apparatus, comprising:
a processing chamber configured to accommodate a substrate; a substrate holding unit configured to hold and rotate the substrate in the processing chamber; a microwave generating source configured to generate a microwave; and a plurality of microwave inlet ports formed at a surface of the processing chamber which faces the substrate in the processing chamber, each of the microwave inlet ports having an opening area that gradually becomes wider toward the substrate, wherein the microwave generated by the microwave generating source is irradiated to the substrate in the processing chamber through the microwave inlet ports to heat the substrate. |
地址 |
Tokyo JP |