| 摘要 |
Disclosed is a deposition device having a spin nozzle unit capable of depositing a thin film on a substrate for a flat display device and improving the deposited quality. The substrate deposition device for a flat display device comprises: a process chamber to provide a space wherein a substrate is received to deposit a thin film thereon; and a gas spraying part arranged on the upper part of the process chamber, and alternately spraying several kinds of deposition gases to the substrate. The gas spraying part comprises: a plurality of spin nozzle units having a cylindrical shape with a length corresponding to the substrate, formed along a moving direction of the substrate in parallel to each other, having a plurality of nozzle parts formed on the outer surface to provide the deposition gases to the substrate by turning on a central axis in parallel with the substrate; and a housing receiving the spin nozzle units to be rotated, having a plurality of spraying holes formed on the bottom surface facing the substrate to provide the deposition gases, received by the spin nozzle units, to the substrate. |
