发明名称 PLACEMENT TABLE AND PLASMA PROCESSING APPARATUS
摘要 The purpose of the present invention is to enhance a resistance against RF noises. According to the present invention, a placement comprises: a base; an electrostatic chuck disposed on an upper part of the base having a placement surface wherein an object to process is disposed; a plurality of heat generating members disposed on opposite side to the placement surface of the electrostatic chuck; a power supply to generate an electric current to generate heat of each of a plurality of heat generating members; a plurality of cables to conduct the electric current between each of the plurality of heat generating members and the power supply; and a filter disposed in each of a plurality of cables to remove high frequency components having higher frequency than the electric current.
申请公布号 KR20150055580(A) 申请公布日期 2015.05.21
申请号 KR20140156080 申请日期 2014.11.11
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUMOTO NAOKI;HAYASHI DAISUKE
分类号 H01L21/683;B23Q3/15;H01L21/324;H02N13/00;H05H1/46 主分类号 H01L21/683
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