发明名称 |
PLACEMENT TABLE AND PLASMA PROCESSING APPARATUS |
摘要 |
The purpose of the present invention is to enhance a resistance against RF noises. According to the present invention, a placement comprises: a base; an electrostatic chuck disposed on an upper part of the base having a placement surface wherein an object to process is disposed; a plurality of heat generating members disposed on opposite side to the placement surface of the electrostatic chuck; a power supply to generate an electric current to generate heat of each of a plurality of heat generating members; a plurality of cables to conduct the electric current between each of the plurality of heat generating members and the power supply; and a filter disposed in each of a plurality of cables to remove high frequency components having higher frequency than the electric current. |
申请公布号 |
KR20150055580(A) |
申请公布日期 |
2015.05.21 |
申请号 |
KR20140156080 |
申请日期 |
2014.11.11 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MATSUMOTO NAOKI;HAYASHI DAISUKE |
分类号 |
H01L21/683;B23Q3/15;H01L21/324;H02N13/00;H05H1/46 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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