| 发明名称 |
Composition of Matter and Molecular Resist Made Therefrom |
| 摘要 |
Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent;;;wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms. |
| 申请公布号 |
US2015140491(A1) |
申请公布日期 |
2015.05.21 |
| 申请号 |
US201414519924 |
申请日期 |
2014.10.21 |
| 申请人 |
Robinson Alex Philip Graham;Yang Dongxu;Frommhold Andreas;Lada Thomas;Roth John L.;Xue Xiang |
发明人 |
Robinson Alex Philip Graham;Yang Dongxu;Frommhold Andreas;Lada Thomas;Roth John L.;Xue Xiang |
| 分类号 |
G03F7/027 |
主分类号 |
G03F7/027 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A photosensitive composition comprising:
a. At least one ester, having a structure chosen from (I), (II), (III) or (IV); b. at least one photo acid generator; c. at least one crosslinker; and d. at least one solvent; wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms. |
| 地址 |
Northfield GB |
