METHOD OF PROCESSING A SEMICONDUCTOR WAFER SUCH AS TO MAKE PROTOTYPES AND RELATED APPARATUS

摘要

A method of processing a semiconductor wafer may include providing a rotatably alignable photolithography mask that includes different mask images. Each mask image may be in a corresponding different mask sector. The method may also include performing a series of exposures with the rotatably alignable photolithography mask at different rotational alignments with respect to the semiconductor wafer so that the different mask images produce at least one working semiconductor wafer sector, and at least one non-working semiconductor wafer sector.

主权项

1. A method of processing a semiconductor wafer comprising:
providing a rotatably alignable photolithography mask comprising a plurality of different mask images, each mask image in a corresponding different mask sector; and performing a series of exposures with the rotatably alignable photolithography mask at different rotational alignments with respect to the semiconductor wafer so that the different mask images produce at least one working semiconductor wafer sector, and at least one non-working semiconductor wafer sector.