| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition capable of forming a cured film meeting required characteristics with high level and in a balanced state with respect to a protective film and an interlayer insulating film and capable of being developed even with an inorganic alkali developer. <P>SOLUTION: A radiation-sensitive composition contains [A<SP POS="POST">1</SP>] a polysiloxane obtained by hydrolysis condensation of tetraethoxysilane or a partial hydrolysate thereof, a hydrolyzable silane compound represented by the following formula (1) or a partial hydrolysate thereof and a hydrolyzable silane compound represented by the following formula (2) or a partial hydrolysate thereof; [B] a compound having two or more ethylenically unsaturated groups (except for the component [A<SP POS="POST">1</SP>]); and [C] a photo-radical polymerization initiator. [In the formula, R<SP POS="POST">1</SP>and R<SP POS="POST">3</SP>indicate an alkyl group having 1 to 6 carbon atoms, R<SP POS="POST">2</SP>indicates an alkyl group or the like having 1 to 20 carbon atoms, m indicates an integer number of 1 to 3, n indicates an integer number of 0 to 6, x indicates an integer number of 1 to 3, y indicates an integer number of 1 to 6, and z indicates an integer number or 0 to 3.] <P>COPYRIGHT: (C)2013,JPO&INPIT |
