| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a low cost deposition film with high gas barrier property and excellent transparency, hardly generating cracks of the deposition film as a film for wrapping fresh foods, processed foods, medical products, electronic part, or others. <P>SOLUTION: In the deposition film having a base material comprising a polymer film and an inorganic compound layer constituted by forming a film of SiOx by an electron beam system vacuum deposition method on at least one face of the base material, the yellow degree (YI) measured by superposing the five sheets of the deposition film with film thickness of 15 to 35 nm is 30 or less and crack generation start strain quantity [%] of the deposition film is 2.5% or more. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
