| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a conductive film having characteristics of low resistance, high reflectance, small surface roughness, high sulfur resistance, and high heat resistance, and to provide a sputtering target used for forming the conductive film.SOLUTION: A conductive film contains 0.1 to 1.5 atom% of at least one of In and Sn, further contains 0.1 to 3.5 atom% of Sb, a remaining part is constituted of silver alloy having component compositions composed of Ag and inevitable impurities, and has less than 0.8 nm of surface roughness Ra. The conductive film is laminated with a transparent conductive film of an organic EL element on a surface and is laminated with an electroluminescent layer containing an organic EL layer further thereon, and is suitable for a reflective electrode film for the organic EL element.</p> |
