发明名称 Imprint lithography
摘要 <p>An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.</p>
申请公布号 EP1688790(B1) 申请公布日期 2015.05.20
申请号 EP20050257614 申请日期 2005.12.12
申请人 ASML NETHERLANDS B.V. 发明人 SIMON, KLAUS
分类号 G03F7/00;B82Y10/00;B82Y40/00 主分类号 G03F7/00
代理机构 代理人
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