MASK FOR DEPOSITION AND METHOD OF MANUFACTURING THE SAME

摘要

A manufacturing method of a mask for deposition: forms a first metal layer which is made of a material different from a mask main body on a first side of the mask main body; forms a first photo resist pattern which exposes a second side partially on the second side of the mask main body; exposes the first metal layer partially by etching the mask main body through a first etching process based on the first photo resist pattern; and removes the first photo resist pattern. After that, the manufacturing method of the mask for deposition: forms a second metal layer which is made of a material different from the mask main body on an etched side of the mask main body; forms a second photo resist pattern which exposes the first metal layer partially on the first metal layer; and forms an opening of the mask for deposition by etching the first and second layers through a second etching process based on the second photo resist pattern; and removes the second photo resist pattern. The manufacturing method of the mask for deposition according to embodiments of the present invention can control the width and thickness of an opening precisely by performing a first etching process and a second etching process separately by using first and second metal layers which are made of a material having an etching selection ratio different from a mask main body.