| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition, forming a pattern having excellent shape, focus margin (DOF) and mask error factor (MEF). <P>SOLUTION: The resist composition includes salt expressed by the formula (AA) and resin having a repeating unit derived from a compound expressed by the formula (II). In the formulas, Q<SP>1</SP>and Q<SP>2</SP>are F or a perfluoroalkyl group; X<SP>1</SP>is single bond or bivalent saturated hydrocarbon group; T is an alicyclic hydrocarbon group, H included in the group may be substituted by a halogen atom, a hydroxyl group, an alkyl group, an alkoxy group, an aryl group, an aralkyl group, a glycidyloxy group or an acyl group, -CH<SB>2</SB>- included in the group may be substituted by at least one -SO<SB>2</SB>-, and further substituted by -CO-, -O-, -S- or the like; Z<SP>+</SP>indicates organic cation; R<SP>3</SP>indicates H, a halogen atom or a halogen atom containing alkyl group; and X indicates -CH<SB>2</SB>-, -O- or -S-. <P>COPYRIGHT: (C)2011,JPO&INPIT |
