发明名称 大きな面積にわたってナノ構造を製造するためのシステムおよび方法
摘要 <p>A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.</p>
申请公布号 JP5721858(B2) 申请公布日期 2015.05.20
申请号 JP20130545610 申请日期 2011.12.20
申请人 发明人
分类号 G03F7/20;G02B19/00;H01L21/027 主分类号 G03F7/20
代理机构 代理人
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