发明名称 |
SHOWER HEAD ASSEMBLY AND PLASMA PROCESSING APPARATUS |
摘要 |
An objective of the present invention is to provide a shower head assembly having good thermal responsiveness and thermal uniformity. According to the present invention, the shower head assembly supplies gas and comprises an electrode plate and a ceramic base body to support the electrode plate. The ceramic base body comprises: a first and a second gas dispersion space formed on a middle or a periphery of the base body; a first and a second heater electrode layer formed above the first and the second gas dispersion space; a first and a second refrigerant passage formed above the first and the second gas dispersion space and above or below the first and the second heater electrode layer; and a first and a second gas supply passage to supply gas through the first and the second gas dispersion space. The shower head assembly does not have contact surfaces inside the base body. |
申请公布号 |
KR20150054655(A) |
申请公布日期 |
2015.05.20 |
申请号 |
KR20140144034 |
申请日期 |
2014.10.23 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SAITOU MICHISHIGE;MURAKAMI KOICHI;YAMAMOTO TAKASHI |
分类号 |
H01L21/02;H01L21/324;H05H1/46 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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