发明名称 SHOWER HEAD ASSEMBLY AND PLASMA PROCESSING APPARATUS
摘要 An objective of the present invention is to provide a shower head assembly having good thermal responsiveness and thermal uniformity. According to the present invention, the shower head assembly supplies gas and comprises an electrode plate and a ceramic base body to support the electrode plate. The ceramic base body comprises: a first and a second gas dispersion space formed on a middle or a periphery of the base body; a first and a second heater electrode layer formed above the first and the second gas dispersion space; a first and a second refrigerant passage formed above the first and the second gas dispersion space and above or below the first and the second heater electrode layer; and a first and a second gas supply passage to supply gas through the first and the second gas dispersion space. The shower head assembly does not have contact surfaces inside the base body.
申请公布号 KR20150054655(A) 申请公布日期 2015.05.20
申请号 KR20140144034 申请日期 2014.10.23
申请人 TOKYO ELECTRON LIMITED 发明人 SAITOU MICHISHIGE;MURAKAMI KOICHI;YAMAMOTO TAKASHI
分类号 H01L21/02;H01L21/324;H05H1/46 主分类号 H01L21/02
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