| 摘要 |
An extreme ultraviolet light generating apparatus may include a laser beam generating system, a laser control system to control at least one of a beam intensity and an output timing of at least one laser beam output from the laser beam generating system, a chamber provided with at least one inlet to guide the at least one laser beam output from the laser beam generating system into the chamber, and a target supplying part provided in the chamber to supply a target material to a predetermined region inside the chamber. Hence, the CE of the extreme ultraviolet light generating apparatus may be improved. |
