| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a metal mask material suitable as a metal mask excellent in etching property, used in manufacturing an organic EL display and the like, and to provide a metal mask.SOLUTION: A metal mask material is Fe-Ni-based alloy containing Ni and Co of total 30 to 45 mass%, Co of 0 to 6 mass% and the balance Fe with inevitable impurities and satisfies the relationship of the formula 1:I/{I+I+I+I}≤40%, the formula 2:I/{I+I+I+I}≤25%, the formula 3:{I+I}/{I+I+I+I}≤90% where X ray diffraction intensities of crystal orientation (111), (200), (220), (311) are I, I, Iand Irespectively.</p> |
