发明名称 PROBE APPARATUS
摘要 A probe apparatus can measure both of static characteristics and dynamic characteristics of a power device at a wafer level and, particularly, can surely measure dynamic characteristics of a power device at a wafer level without being affected by a measurement line that measures static characteristics. The probe apparatus 10 has a movable mounting table 12 that mounts a wafer W on which multiple power devices are formed; a probe card 14 that is provided above the mounting table 12 and has multiple probes 14A; a conductive film electrode 13 formed on a mounting surface of the mounting table 12 and an outer peripheral surface thereof; and a measurement line 16 that electrically connects the conductive film electrode 13 to a tester 17. Further, the probe apparatus measures electrical characteristics of the power devices on the mounting table 12 at a wafer level. Furthermore, a second measurement line 16 includes a switch device 18 configured to open and close an electric path of the measurement line 16 between the conductive film electrode 13 and the tester 17.
申请公布号 EP2746794(A4) 申请公布日期 2015.05.20
申请号 EP20120833723 申请日期 2012.07.30
申请人 TOKYO ELECTRON LIMITED 发明人 SHINOHARA, EIICHI;TAOKA, KEN
分类号 G01R31/28;G01R1/04;G01R1/067;H01L21/66 主分类号 G01R31/28
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