Multi-beam system for high throughput EBI

摘要

A scanning charged particle beam device configured to image a specimen is described. The scanning charged particle beam device includes a source of charged particles, a condenser lens for influencing the charged particles, an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors, wherein the at least two deflectors are multi-pole deflectors, a multi-pole deflector with an order of poles of 8 or higher, an objective lens, wherein the objective lens is a retarding field compound lens, a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender, or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is a hemispherical beam bender or beam bender having at least two curved electrodes, and at least two detector elements.

主权项

1. A scanning charged particle beam device configured to image a specimen, comprising:
a source of charged particles, a condenser lens for influencing the charged particles; an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors configured to individually deflect the at least two primary beamlets of charged particles so that each primary beamlet appears to come from a different source, wherein the at least two deflectors are multi-pole deflectors with an order of poles of 8 or higher; a multi-pole deflector with an order of poles of 8 or higher; an objective lens configured to focus the at least two primary beamlets onto the specimen, wherein the objective lens is a retarding field compound lens; a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets; a beam bender, a deflector or mirror configured to deflect the at least two signal beamlets, wherein the beam bender is selected from the group consisting of: a hemispherical beam bender and a beam bender having at least two curved electrodes; and at least two detector elements configured to individually measure the at least two signal beamlets.