发明名称 Method for producing molecule immobilizing substrate, and molecule immobilizing substrate
摘要 There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; andchemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film.;There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.
申请公布号 US9034661(B2) 申请公布日期 2015.05.19
申请号 US201012709020 申请日期 2010.02.19
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 Kusaki Wataru;Ishihara Toshinobu;Kinsho Takeshi;Watanabe Takeru
分类号 G01N33/544;G01N33/543;G01N33/53;C08L83/04;C08L83/06 主分类号 G01N33/544
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate having an oxide and/or hydroxyl group, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film, wherein forming, on the substrate, the monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film, comprises immersing the substrate in a solution containing silane compounds represented by the following general formulae (2) and (3) mixed with a silane compound represented by general formula (1) having an alkoxymethoxy group including an alkoxyl group moiety having 1 to 6 carbon atoms, cyano group, or oxiranyl group,if the silane compound represented by general formula (1) has the alkoxymethoxy group including an alkoxyl group moiety having 1 to 6 carbon atoms as a hydroxyl-group precursory functional group, an acid is reacted with the hydroxyl-group precursory functional group to form, on the substrate, the monomolecular film including the hydroxyl groups, which are oriented toward an outmost surface of the monomolecular film, before chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film, andif the silane compound represented by general formula (1) has the oxiranyl group, the oxiranyl group is optionally a hydroxyl-group precursory functional group that is reacted with an acid to form, on the substrate, the monomolecular film including the hydroxyl groups, which are oriented toward an outmost surface of the monomolecular film, before chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film, Y3Si—(CH2)m—Z  (1)wherein, in formula (1), “m” represents an integer of 3 to 16;“Z” represents the alkoxymethoxy group including an alkoxyl group moiety having 1 to 6 carbon atoms, cyano group, or oxiranyl group; andeach “Y” independently represents a halogen atom, or an alkoxyl group having 1 to 4 carbon atoms, and Y′3Si—(CH2)n—CH3  (2)Y′3Si—(CH2)n—OCH3  (3)wherein, in formulae (2) and (3), “n” represents an integer of 0 to “m”;“m” represents the value in the general formula (1); andeach “Y′” independently represents a halogen atom, or an alkoxyl group having 1 to 4 carbon atoms.
地址 Tokyo JP