发明名称 Field-effect device and manufacturing method thereof
摘要 Embodiments relate to a field-effect device that includes a body region, a first source/drain region of a first conductivity type, a second source/drain region, and a pocket implant region adjacent to the first source/drain region, the pocket implant region being of a second conductivity type, wherein the second conductivity type is different from the first conductivity type. The body region physically contacts the pocket implant region.
申请公布号 US9035375(B2) 申请公布日期 2015.05.19
申请号 US201313740048 申请日期 2013.01.11
申请人 Infineon Technologies AG 发明人 Shrivastava Mayank;Gossner Harald;Rao Ramgopal;Shojaei Baghini Maryam
分类号 H01L29/78;H01L29/08;H01L29/10;H01L29/66;H01L29/739;H01L21/265;H01L29/06 主分类号 H01L29/78
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A field-effect device, comprising: a body region of a second conductivity type; a well region formed in the body region; a first source/drain region of a first conductivity type; a doped region of the first conductivity type disposed laterally adjacent to the first source/drain region, a doping concentration level in the doped region being lower than a doping concentration level of the first source/drain region; a second source/drain region of the first conductivity type or of a second conductivity type disposed in the well region; and a pocket implant region adjacent to the first source/drain region, the pocket implant region being of the second conductivity type and comprising a first subregion adjacent to the first source/drain region and a second subregion adjacent to the first subregion and between the first subregion and the body region, a doping concentration level in the first subregion of the pocket implant region being higher than a doping concentration level of the well region and being higher than the doping concentration level of the doped region and further being higher than a doping concentration level of the body region, and a doping concentration level in the second subregion of the pocket implant region being lower than the doping concentration level in the first subregion of the pocket implant region and being higher than the doping concentration level of the body region, wherein the second conductivity type is different from the first conductivity type, and wherein the body region physically contacts the pocket implant region.
地址 Neubiberg DE