发明名称 Thin film transistor, thin film transistor array panel including the same, and method of manufacturing the same
摘要 A thin film transistor, a thin film transistor array panel including the same, and a method of manufacturing the same are provided, wherein the thin film transistor includes a channel region including an oxide semiconductor, a source region and a drain region connected to the channel region and facing each other at both sides with respect to the channel region, an insulating layer positioned on the channel region, and a gate electrode positioned on the insulating layer, wherein an edge boundary of the gate electrode and an edge boundary of the channel region are substantially aligned.
申请公布号 US9034691(B2) 申请公布日期 2015.05.19
申请号 US201414468472 申请日期 2014.08.26
申请人 Samsung Display Co., Ltd. 发明人 Lee Yong Su;Khang Yoon Ho;Kim Dong Jo;Na Hyun Jae;Park Sang Ho;Yu Se Hwan;Chang Chong Sup
分类号 H01L21/02;H01L29/66;H01L27/12;H01L29/786;H01L21/385;H01L21/441 主分类号 H01L21/02
代理机构 F. Chau & Associates, LLC 代理人 F. Chau & Associates, LLC
主权项 1. A method of manufacturing a thin film transistor, the method comprising: forming a semiconductor pattern including an oxide semiconductor material; forming an insulating layer and a gate electrode that traverse each other and overlap the semiconductor pattern; and performing a reduction process on the semiconductor pattern that is not covered by the insulating layer and the gate electrode to form a channel region covered by the gate electrode and to form a source region and a drain region facing each other with respect to the channel region.
地址 Yongin, Gyeonggi-do KR
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