发明名称 |
Thin film transistor, thin film transistor array panel including the same, and method of manufacturing the same |
摘要 |
A thin film transistor, a thin film transistor array panel including the same, and a method of manufacturing the same are provided, wherein the thin film transistor includes a channel region including an oxide semiconductor, a source region and a drain region connected to the channel region and facing each other at both sides with respect to the channel region, an insulating layer positioned on the channel region, and a gate electrode positioned on the insulating layer, wherein an edge boundary of the gate electrode and an edge boundary of the channel region are substantially aligned. |
申请公布号 |
US9034691(B2) |
申请公布日期 |
2015.05.19 |
申请号 |
US201414468472 |
申请日期 |
2014.08.26 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Lee Yong Su;Khang Yoon Ho;Kim Dong Jo;Na Hyun Jae;Park Sang Ho;Yu Se Hwan;Chang Chong Sup |
分类号 |
H01L21/02;H01L29/66;H01L27/12;H01L29/786;H01L21/385;H01L21/441 |
主分类号 |
H01L21/02 |
代理机构 |
F. Chau & Associates, LLC |
代理人 |
F. Chau & Associates, LLC |
主权项 |
1. A method of manufacturing a thin film transistor, the method comprising:
forming a semiconductor pattern including an oxide semiconductor material; forming an insulating layer and a gate electrode that traverse each other and overlap the semiconductor pattern; and performing a reduction process on the semiconductor pattern that is not covered by the insulating layer and the gate electrode to form a channel region covered by the gate electrode and to form a source region and a drain region facing each other with respect to the channel region. |
地址 |
Yongin, Gyeonggi-do KR |