发明名称 INSULATED GATE BIPOLAR TRANSISTOR AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a FS (Field Stop) IGBT which can control LT (LifeTime) of a residual hole with high precision and inhibit leakage current and has little loss and enable high-speed switching with a simple structure; and provide a manufacturing method of the FS IGBT.SOLUTION: An IGBT 10, 11 comprises: an LT control layer 5 formed in a semiconductor substrate 1S in a thickness direction by ion implantation of helium (He) with a predetermined half bandwidth; and an FS layer 6 formed in the semiconductor substrate 1S in a thickness direction by ion implantation of hydrogen (H) with a predetermined half bandwidth, in which a half bandwidth region of the LT control layer 5 and a half bandwidth region of the FS layer 6 overlap each other.
申请公布号 JP2015095559(A) 申请公布日期 2015.05.18
申请号 JP20130234260 申请日期 2013.11.12
申请人 DENSO CORP 发明人 AIDA KENTA
分类号 H01L29/739;H01L21/265;H01L21/336;H01L29/78 主分类号 H01L29/739
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