发明名称 MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To enhance the tolerance to RF noise.SOLUTION: A mounting table includes a base, an electrostatic chuck arranged above the base, and having a mounting surface on which a workpiece is mounted, a plurality of heating members arranged on the side opposite from the mounting surface of the electrostatic chuck, a power supply generating a current for heating the plurality of heating members, respectively, wires provided to extend from respective heating members in a direction crossing the mounting surface, and conducting the current between the plurality of heating members and the power supply, and a filter disposed in the wires and removing the high frequency components having a frequency higher than that of the current.
申请公布号 JP2015095409(A) 申请公布日期 2015.05.18
申请号 JP20130235194 申请日期 2013.11.13
申请人 TOKYO ELECTRON LTD 发明人 MATSUMOTO NAOKI;HAYASHI DAISUKE
分类号 H05H1/46;C23C16/458;C23C16/46;C23C16/505;H01L21/3065;H01L21/683 主分类号 H05H1/46
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