SUBSTRATE CARRYING DEVICE AND EFEM

摘要

PROBLEM TO BE SOLVED: To provide a substrate carrying device capable of replacing an atmosphere on a wafer surface with a small amount of gas, and an EFEM.SOLUTION: A substrate carrying device comprises: a carrying arm 22 supported by a base and holding and carrying a wafer W; a pole provided on the same base as the carrying arm 22; a cover 3 arranged in a position to face the carrying arm 22 via the pole and capable of covering the wafer W; and gas supplying means for supplying gas having characteristics different from that of a peripheral atmosphere of the cover 3. The device is configured that when the wafer W is carried by the carrying arm 22, the atmosphere on the wafer W surface can be replaced with the gas by supplying the gas by the gas supplying means.