| 摘要 |
PROBLEM TO BE SOLVED: To provide a focused ion beam device and a focus adjustment method of ion beam capable of performing focus adjustment while minimizing the damage on a sample, without relying upon the structure of a sample.SOLUTION: A focused ion beam device includes an ion source generating an ion beam, a lens system for focusing the ion beam on a sample, a detector for detecting secondary electrons generated from the sample, and a control section for controlling the lens system. The control section performs control for changing the focus of the ion beam by irradiating the sample with the ion beam without scanning, and changing the intensity of an objective lens during irradiation of the ion beam, measures the signal strength of secondary electrons generated from the sample while changing the intensity of an objective lens, and performs focus adjustment of the ion beam based on the intensity of an objective lens when the signal strength of secondary electrons thus measured is minimized. |
