发明名称 MANUFACTURING METHOD FOR MICROLENS ARRAY SUBSTRATE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a microlens array substrate, which reduces man-hour in a lens layer polishing step and improves flatness; the microlens array substrate; an electro-optical device; and an electronic device.SOLUTION: A manufacturing method for a microlens array substrate 10 includes steps of; forming a plurality of recesses 12 in a display area E of a first surface 11a of a light transmissive substrate 11; forming a light transmissive lens layer 13 having a refractive index different from that of the substrate 11 such that the lens layer 13 covers the first surface 11a of the substrate 11 and fills the plurality of recesses 12; placing a protective member 72 to cover the display area E of the lens layer 13; removing a portion of the lens layer 13 while removing the protective member 72; and polishing a surface 13a of the lens layer 13.
申请公布号 JP2015094879(A) 申请公布日期 2015.05.18
申请号 JP20130234710 申请日期 2013.11.13
申请人 SEIKO EPSON CORP 发明人 ITO SATOSHI
分类号 G02B3/00;G02F1/1335 主分类号 G02B3/00
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