发明名称 用于对基底进行图案化的系统与方法;SYSTEM AND METHOD FOR PATTERNING SUBSTRATE
摘要 在一个实施例中,一种用于对基底进行图案化的系统包含:电浆腔室;功率源,用于在所述电浆腔室内产生电浆;以及提取板系统,包括多个孔径且沿着所述电浆腔室的一侧而设置。所述提取板系统经配置以接收相对于所述电浆腔室而对所述提取板系统加偏压的提取电压,其中所述多个孔径经配置以从所述电浆提取多个相应带电粒子子束。所述系统还包含:投影光学系统,用于将所述多个带电粒子子束中的至少一者引导到所述基底。; a power source to generate a plasma within the plasma chamber; and an extraction plate system comprising a plurality of apertures and disposed along a side of the plasma chamber. The extraction plate system is configured to receive an extraction voltage that biases the extraction plate system with respect to the plasma chamber wherein the plurality of apertures are configured to extract a plurality of respective charged particle beamlets from the plasma. The system further includes a projection optics system to direct at least one of the plurality of charged particle beamlets to the substrate.
申请公布号 TW201519275 申请公布日期 2015.05.16
申请号 TW103137524 申请日期 2014.10.30
申请人 瓦里安半导体设备公司 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 辛克莱 法兰克 SINCLAIR, FRANK;欧尔森 约瑟C OLSON, JOSEPH C.
分类号 H01J37/05(2006.01);H01J37/147(2006.01) 主分类号 H01J37/05(2006.01)
代理机构 代理人 叶璟宗郑婷文詹富闵
主权项
地址 美国 US