The present invention relates to a substrate depositing apparatus. The substrate depositing apparatus according to the present invention includes a deposition source part which evaporates or sublimates an organic material received in an inner space and sprays the evaporated or sublimated organic material to a substrate and a heating unit which is arranged near the deposition source part to heat the deposition source part and non-uniformly heats the deposition source part to remove a temperature deviation according to the inner position of the deposition source part. The substrate depositing apparatus according to the present invention forms a thin film layer with a uniform thickness on the substrate through the heating unit to non-uniformly heat the deposition source part to remove the temperature deviation according to the inner position of the deposition source part.
