AN ATOMIC LAYER DEPOSITION REACTOR FOR PROCESSING A BATCH OF SUBSTRATES AND METHOD THEREOF

摘要

The invention relates to a method that includes providing a reaction chamber module of an atomic layer deposition reactor for processing a batch of substrates by an atomic layer deposition process and loading the batch of substrates before processing into the reaction chamber module via a different route than the batch of substrates is unloaded after processing. The invention also relates to a corresponding apparatus.