发明名称 ADDITIVES TO LITHO INKS TO ELIMINATE INK FEEDBACK
摘要 <p>Provided are web offset lithographic ink compositions that contain an alkyl thioether surfactant an alkoxylated modified rosin or a combination thereof. The ink compositions can be oil based inks or water based inks that can be radiation curable. The resulting ink compositions can be used in web offset lithographic printing to substantially reduce or eliminate the ink feedback and ink build up that occurs during printing. Also provided are methods for reducing or eliminating ink feedback and build up during lithographic printing processes.</p>
申请公布号 IN1974DEN2014(A) 申请公布日期 2015.05.15
申请号 IN2014DE01974 申请日期 2014.03.14
申请人 SUN CHEMICAL CORPORATION 发明人 KRISHNAN RAMASAMY;JONES JEFF;HELLIBLAU MATTHIAS
分类号 C09D11/00;B41M1/06;C09D11/02 主分类号 C09D11/00
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