POLISHING SLURRY ADDOTIVE COMPOSITION AND SLURRY COMPOSITION INCLUDING THE POLISHING SLURRY ADDOTIVE COMPOSITION

摘要

The present invention relates to an additive for polishing slurry and a slurry composition including the same, which can decrease an amount of dishing generated when being used for polishing or leveling anti-oxidant films and, more specifically, an additive for polishing slurry, comprising a polyacrylic acid based immobilizing agent and a glycol based composite forming agent, and a slurry composition, comprising the additive for polishing slurry with a polyacrylic acid based immobilizing agent, a glycol based composite forming agent and a polishing solution having a polishing particle and a dispersing agent, thereby decreasing dishing situations and improving the performance of super-fine devices.