| 摘要 |
PROBLEM TO BE SOLVED: To provide a distributed power arrangement to provide local power delivery in a plasma processing system during substrate processing.SOLUTION: The distributed power arrangement includes a set of direct current (DC) power supply units. The distributed power arrangement also includes a plurality of power generators, which are configured to receive power from the set of DC power supply units. Each power generator of the plurality of power generators is coupled to a set of electrical elements, thereby enabling each power generator of the plurality of power generators to control the local power delivery. A main controller monitors matching conditions within each power generator on the basis of status data sent by local controllers and, if the matching conditions fall outside an acceptable range, sends an alert to an operator. |
