发明名称 SILVER REFLECTORS FOR SEMICONDUCTOR PROCESSING CHAMBERS
摘要 PROBLEM TO BE SOLVED: To provide a reflector for use in a semiconductor processing chamber.SOLUTION: The reflector comprises: a reflector substrate disposed in the processing chamber to reflect radiation originating from a heating lamp 212 mounted on the semiconductor processing chamber; a reflective layer disposed on the reflector substrate and containing silver; an adhesion layer for adhesion of the reflective layer to the reflector substrate; and a diffusion barrier between the reflective layer and the reflector substrate. The diffusion barrier is selected from nickel, a nickel-chromium alloy and a chromium nitride alloy.
申请公布号 JP2015092564(A) 申请公布日期 2015.05.14
申请号 JP20140208871 申请日期 2014.10.10
申请人 APPLIED MATERIALS INC 发明人 JOSEPH M RANISH;KELLY CHURTON;MARK E LINDSAY;MISCHA ANN PLESHA;SAGE BERTA
分类号 H01L21/26;C23C16/46;H01L21/31 主分类号 H01L21/26
代理机构 代理人
主权项
地址