发明名称 |
SILVER REFLECTORS FOR SEMICONDUCTOR PROCESSING CHAMBERS |
摘要 |
PROBLEM TO BE SOLVED: To provide a reflector for use in a semiconductor processing chamber.SOLUTION: The reflector comprises: a reflector substrate disposed in the processing chamber to reflect radiation originating from a heating lamp 212 mounted on the semiconductor processing chamber; a reflective layer disposed on the reflector substrate and containing silver; an adhesion layer for adhesion of the reflective layer to the reflector substrate; and a diffusion barrier between the reflective layer and the reflector substrate. The diffusion barrier is selected from nickel, a nickel-chromium alloy and a chromium nitride alloy. |
申请公布号 |
JP2015092564(A) |
申请公布日期 |
2015.05.14 |
申请号 |
JP20140208871 |
申请日期 |
2014.10.10 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
JOSEPH M RANISH;KELLY CHURTON;MARK E LINDSAY;MISCHA ANN PLESHA;SAGE BERTA |
分类号 |
H01L21/26;C23C16/46;H01L21/31 |
主分类号 |
H01L21/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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