Method for depositing a thin film, and resulting material

摘要

The invention relates to a method for producing a substrate coated on a first surface with at least one transparent and electrically conductive thin film containing at least one oxide, including the following steps: depositing said at least one thin film on said substrate; subjecting said at least one thin film to a heat treatment step in which said at least one film is irradiated with a radiation having a wavelength of between 500 and 2000 nm and focused on an area of said at least one film, at least one dimension of which does not exceed 10 cm, said radiation being emitted by at least one radiation device located opposite said at least one film, and a relative movement being generated between said radiation device and said substrate so as to treat the desired surface, said heat treatment being such that the resistivity of said at least one film is reduced during the treatment.