Method of Fabricating a Uniformly Aligned Planar Array of Nanowires Using Atomic Layer Deposition

摘要

Invention for producing a relatively large uniformly aligned planar array of nanowires comprising:
step 1) fabricating a template for producing nanowires in which the template comprises an alternating multilayer stack of thin film substrate layers and inert insulating thin film layers using atomic layer deposition; andstep 2) fabricating a relatively large uniformly aligned planar array of nanowires by depositing atoms or molecules along the thin film substrate layers on at least one side of the template with the use of atomic layer deposition.

主权项

1. Method of fabricating a uniformly aligned planar array of nanowires comprising the steps of:
1) fabricating a template for producing nanowires using a first atomic layer deposition process, wherein the template comprises an alternating multilayer stack of thin film substrate layers and inert insulating thin film layers; and 2) fabricating the uniformly aligned planar array of nanowires by depositing particles selected from the group of atoms and molecules along the thin film substrate layers on at least one side of the template using a second atomic layer deposition process, such that the inert thin film layers resist chemisorption of the precursor particles applied to produce the nanowires in the second atomic layer deposition process.