PYROMETER BACKGROUND ELIMINATION

摘要

Embodiments disclosed herein provide an RTP system for processing a substrate. An RTP chamber has a radiation source configured to deliver radiation to a substrate disposed within a processing volume. One or more pyrometers are coupled to the chamber body opposite the radiation source. In one example, the radiation source is disposed below the substrate and the pyrometers are disposed above the substrate. In another example, the radiation source is disposed above the substrate and the pyrometers are disposed below the substrate. The substrate may be supported in varying manners configured to reduce physical contact between the substrate support and the substrate. An edge ring and shield are disposed within the processing volume and are configured to reduce or eliminate background radiation from interfering with the pyrometers. Additionally, an absorbing surface may be coupled to the chamber body to further reduce background radiation interference.

主权项

1. An apparatus for reducing background radiation, comprising:
a chamber body defining a processing volume; a radiation source coupled to the chamber body; one or more pyrometers coupled to the chamber body opposite the radiation source; a support ring disposed within the processing volume; an edge ring disposed on the support ring; and a radiation shield disposed above the edge ring, wherein an inner diameter of the radiation shield extends radially inward over a substrate support member of the edge ring.