发明名称 |
PLACEMENT TABLE AND PLASMA PROCESSING APPARATUS |
摘要 |
A placement table includes: a base; an electrostatic chuck disposed on the base and including a placement surface on which a workpiece is placed; a plurality of heat generating members disposed at a side opposite to the placement surface of the electrostatic chuck; a power supply configured to generate a current for causing each of the plurality of heat generating members to generate heat; a plurality of electric wires installed to extend in a direction crossing the placement surface from the plurality of heat generating members, respectively, and configured to connect the power supply with the heat generating members, respectively; and a filter mounted on each of the plurality of electric wires to remove a high frequency component having a frequency higher than that of the current generated by the power supply. |
申请公布号 |
US2015129134(A1) |
申请公布日期 |
2015.05.14 |
申请号 |
US201414539397 |
申请日期 |
2014.11.12 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MATSUMOTO Naoki;HAYASHI Daisuke |
分类号 |
H01L21/683;H01L21/67 |
主分类号 |
H01L21/683 |
代理机构 |
|
代理人 |
|
主权项 |
1. A placement table comprising:
a base; an electrostatic chuck disposed on the base and including a placement surface on which a workpiece is placed; a plurality of heat generating members disposed at a side opposite to the placement surface of the electrostatic chuck; a power supply configured to generate a current for causing each of the plurality of heat generating members to generate heat; a plurality of electric wires installed to extend in a direction crossing the placement surface from the plurality of heat generating members, respectively, and configured to connect the power supply with the heat generating members, respectively; and a filter mounted on each of the plurality of electric wires to remove a high frequency component having a frequency higher than that of the current generated by the power supply. |
地址 |
Tokyo JP |