发明名称 PLACEMENT TABLE AND PLASMA PROCESSING APPARATUS
摘要 A placement table includes: a base; an electrostatic chuck disposed on the base and including a placement surface on which a workpiece is placed; a plurality of heat generating members disposed at a side opposite to the placement surface of the electrostatic chuck; a power supply configured to generate a current for causing each of the plurality of heat generating members to generate heat; a plurality of electric wires installed to extend in a direction crossing the placement surface from the plurality of heat generating members, respectively, and configured to connect the power supply with the heat generating members, respectively; and a filter mounted on each of the plurality of electric wires to remove a high frequency component having a frequency higher than that of the current generated by the power supply.
申请公布号 US2015129134(A1) 申请公布日期 2015.05.14
申请号 US201414539397 申请日期 2014.11.12
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUMOTO Naoki;HAYASHI Daisuke
分类号 H01L21/683;H01L21/67 主分类号 H01L21/683
代理机构 代理人
主权项 1. A placement table comprising: a base; an electrostatic chuck disposed on the base and including a placement surface on which a workpiece is placed; a plurality of heat generating members disposed at a side opposite to the placement surface of the electrostatic chuck; a power supply configured to generate a current for causing each of the plurality of heat generating members to generate heat; a plurality of electric wires installed to extend in a direction crossing the placement surface from the plurality of heat generating members, respectively, and configured to connect the power supply with the heat generating members, respectively; and a filter mounted on each of the plurality of electric wires to remove a high frequency component having a frequency higher than that of the current generated by the power supply.
地址 Tokyo JP