DEPOSITION SYSTEMS HAVING DEPOSITION CHAMBERS CONFIGURED FOR IN-SITU METROLOGY WITH RADIATION DEFLECTION AND RELATED METHODS

摘要

Deposition chambers (102) for use with deposition systems (100) include a chamber wall (112) comprising a transparent material. The chamber wall may include an outer metrology window (122) surface extending from and at least partially circumscribed by an outer major surface of the wall, and an inner metrology window surface extending from and at least partially circumscribed by an inner major surface of the wall. The window surfaces may be oriented at angles to the major surfaces. Deposition systems include such chambers. Methods include the formation of such deposition chambers. The depositions systems and chambers may be used to perform in-situ metrology.

主权项

1. A deposition chamber for a deposition system, comprising:
at least one chamber wall including a transparent material at least substantially transparent to electromagnetic radiation over at least a range of wavelengths, the at least one chamber wall comprising:
an outer major surface;an inner major surface oriented at least substantially parallel to the outer major surface;an outer window surface extending from and at least partially circumscribed by the outer major surface, the outer window surface oriented at an angle to the outer major surface; andan inner window surface extending from and at least partially circumscribed by the inner major surface, the inner window surface oriented at an angle to the inner major surface, at least a portion of the inner window surface aligned with at least a portion of the outer window surface along an axis perpendicular to the outer major surface and the inner major surface.